TY - GEN
T1 - A 24 kb single-well mixed 3T gain-cell eDRAM with body-bias in 28 nm FD-SOI for refresh-free DSP applications
AU - Narinx, Jonathan
AU - Giterman, Robert
AU - Bonetti, Andrea
AU - Frigerio, Nicolas
AU - Aprile, Cosimo
AU - Burg, Andreas
AU - Leblebici, Yusuf
N1 - Publisher Copyright:
© 2019 Institute of Electrical and Electronics Engineers Inc.. All rights reserved.
PY - 2019/11/1
Y1 - 2019/11/1
N2 - Logic-compatible gain-cell embedded DRAM (GC-eDRAM) is an emerging alternative to conventional SRAM for memory-dominated system-on-chip (SoC) designs due to its high-density, low-power, and two-ported operation. Although GCs have a limited data retention time (DRT) at deeply scaled technology nodes, there are many DSP applications which only require short-term data storage and can therefore avoid refresh. In this paper, we present a novel single-well mixed 3T GC implementation in 28 nm FD-SOI technology. The proposed GC is supplied with body-bias control to improve the DRT by suppressing the leakage through the write port, and extend the maximum operating frequency by forward body-biasing the read port. A 24 kbit GC-eDRAM macro implementing the proposed 3T GC was fabricated in 28 nm FD-SOI technology, resulting in the highest density logic-compatible embedded memory fabricated in any 28 nm process with over 2× higher density compared to a 6T SRAM cell, over 4× higher DRT compared to a conventional 3T GC, and 38×–47× lower static power compared to conventional single-ported and two-ported SRAMs.
AB - Logic-compatible gain-cell embedded DRAM (GC-eDRAM) is an emerging alternative to conventional SRAM for memory-dominated system-on-chip (SoC) designs due to its high-density, low-power, and two-ported operation. Although GCs have a limited data retention time (DRT) at deeply scaled technology nodes, there are many DSP applications which only require short-term data storage and can therefore avoid refresh. In this paper, we present a novel single-well mixed 3T GC implementation in 28 nm FD-SOI technology. The proposed GC is supplied with body-bias control to improve the DRT by suppressing the leakage through the write port, and extend the maximum operating frequency by forward body-biasing the read port. A 24 kbit GC-eDRAM macro implementing the proposed 3T GC was fabricated in 28 nm FD-SOI technology, resulting in the highest density logic-compatible embedded memory fabricated in any 28 nm process with over 2× higher density compared to a 6T SRAM cell, over 4× higher DRT compared to a conventional 3T GC, and 38×–47× lower static power compared to conventional single-ported and two-ported SRAMs.
UR - https://www.scopus.com/pages/publications/85089349422
U2 - 10.1109/A-SSCC47793.2019.9056985
DO - 10.1109/A-SSCC47793.2019.9056985
M3 - Conference contribution
AN - SCOPUS:85089349422
T3 - Proceedings - 2019 IEEE Asian Solid-State Circuits Conference, A-SSCC 2019
SP - 219
EP - 222
BT - Proceedings - 2019 IEEE Asian Solid-State Circuits Conference, A-SSCC 2019
PB - Institute of Electrical and Electronics Engineers
T2 - 15th IEEE Asian Solid-State Circuits Conference, A-SSCC 2019
Y2 - 4 November 2019 through 6 November 2019
ER -