A Novel Approach for Colloidal Lithography: From Dry Particle Assembly to High-Throughput Nanofabrication

Sivan Tzadka, Carlos Ureña Martin, Esti Toledo, Abed Al Kader Yassin, Ashish Pandey, Guillaume Le Saux, Angel Porgador, Mark Schvartzman

Research output: Contribution to journalArticlepeer-review


We introduce a novel approach for colloidal lithography based on the dry particle assembly into a dense monolayer on an elastomer, followed by mechanical transfer to a substrate of any material and curvature. This method can be implemented either manually or automatically and it produces large area patterns with the quality obtained by the state-of-the-art colloidal lithography at a very high throughput. We first demonstrated the fabrication of nanopatterns with a periodicity ranging between 200 nm and 2 μm. We then demonstrated two nanotechnological applications of this approach. The first one is antireflective structures, fabricated on silicon and sapphire, with different geometries including arrays of bumps and holes and adjusted for different spectral ranges. The second one is smart 3D nanostructures for mechanostimulation of T cells that are used for their effective proliferation, with potential application in cancer immunotherapy. This new approach unleashes the potential of bottom-up nanofabrication and paves the way for nanoscale devices and systems in numerous applications.

Original languageEnglish
Pages (from-to)17846-17856
Number of pages11
JournalACS applied materials & interfaces
Issue number14
StatePublished - 10 Apr 2024


  • T cells
  • antireflective structures
  • colloidal lithography
  • nanoparticles
  • sapphire
  • self-assembly

ASJC Scopus subject areas

  • General Materials Science


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