Abstract
We report on a simple, high-power, TEA laser operating with N2, XeF and KrF in the UV, with F and Ar in the visible and near IR, and with HF, CO, CO2 and N2O in the IR. Peak power of 0.5 MW and pulse energy of 4.5 mJ are obtained from N2, 1.5 MW and 16 mJ from XeF, and 18 MW and 2.7 J from CO2 in the same device. The performance of the N2 laser is greatly improved (1 MW, 10 mJ) by the addition of NF3 to the lasing mixture. Maximum power and energy are achieved near or above atmospheric pressure.
Original language | English |
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Pages (from-to) | 227-230 |
Number of pages | 4 |
Journal | Optics Communications |
Volume | 30 |
Issue number | 2 |
DOIs | |
State | Published - 1 Jan 1979 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Physical and Theoretical Chemistry
- Electrical and Electronic Engineering