Analytical model of electrodiffusion of metals in fullerene thin films

Bhim P. Kaflé; Isaak Rubinstein; Eugene A. Katz

doi:10.1143/JJAP.44.2803

Analytical model of electrodiffusion of metals in fullerene thin films

Bhim P. Kaflé, Isaak Rubinstein, Eugene A. Katz

Department of Mathematics

Research output: Contribution to journal › Article › peer-review

Abstract

This paper presents a theoretical model of doping of C₆₀ thin films by the diffusion of ions from metal electrodes under the action of external electric bias. In the case of Au diffusion, the final nonlinear parabolic partial differential equation for the concentration of mobile metal ions was solved numerically by the finite difference method for a given electric current (galvanostatic operation). This yields the time evolution of ionic concentration profiles for different currents. A significant increase in the rate of Au ion penetration into C₆₀ films with increasing electric current is predicted by these calculations in agreement with the published experimental observations.

Original language	English
Pages (from-to)	2803-2805
Number of pages	3
Journal	Japanese Journal of Applied Physics
Volume	44
Issue number	4 B
DOIs	https://doi.org/10.1143/JJAP.44.2803
State	Published - 1 Apr 2005

Keywords

Diffusion
Explicit finite difference method
Fullerenes
Thin films

ASJC Scopus subject areas

General Engineering
General Physics and Astronomy

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1143/JJAP.44.2803

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abstract = "This paper presents a theoretical model of doping of C60 thin films by the diffusion of ions from metal electrodes under the action of external electric bias. In the case of Au diffusion, the final nonlinear parabolic partial differential equation for the concentration of mobile metal ions was solved numerically by the finite difference method for a given electric current (galvanostatic operation). This yields the time evolution of ionic concentration profiles for different currents. A significant increase in the rate of Au ion penetration into C60 films with increasing electric current is predicted by these calculations in agreement with the published experimental observations.",

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N2 - This paper presents a theoretical model of doping of C60 thin films by the diffusion of ions from metal electrodes under the action of external electric bias. In the case of Au diffusion, the final nonlinear parabolic partial differential equation for the concentration of mobile metal ions was solved numerically by the finite difference method for a given electric current (galvanostatic operation). This yields the time evolution of ionic concentration profiles for different currents. A significant increase in the rate of Au ion penetration into C60 films with increasing electric current is predicted by these calculations in agreement with the published experimental observations.

AB - This paper presents a theoretical model of doping of C60 thin films by the diffusion of ions from metal electrodes under the action of external electric bias. In the case of Au diffusion, the final nonlinear parabolic partial differential equation for the concentration of mobile metal ions was solved numerically by the finite difference method for a given electric current (galvanostatic operation). This yields the time evolution of ionic concentration profiles for different currents. A significant increase in the rate of Au ion penetration into C60 films with increasing electric current is predicted by these calculations in agreement with the published experimental observations.

KW - Diffusion

KW - Explicit finite difference method

KW - Fullerenes

KW - Thin films

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JF - Japanese Journal of Applied Physics

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ER -

Analytical model of electrodiffusion of metals in fullerene thin films

Abstract

Keywords

ASJC Scopus subject areas

UN SDGs

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