Applications of the Alpha Energy Loss Spectroscopy Method in Solid State Device Fabrication

L Arazi, I Kelson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In the course of solid state device fabrication a multiplicity of steps are performed where material is being added to a substrate or removed from it. The Alpha Energy Loss Spectroscopy method provides information - either in real time or ex situ - about essential characteristics of these processes growth rate, layer thickness and stoichiometry, etching rate, surface morphology. The method consists of implanting alpha-emitting nuclei in the original substrate and measuring the energy lost by alpha-particles of well defined initial energy as they traverse the investigated layer. Specific examples where Radium-224, implanted by the alpha-induced recoil of Thorium-228, is used are presented and discussed
Original languageEnglish
Title of host publicationThe 23rd Congress of the Nuclear Societies in Israel
Pages207
StatePublished - 2006

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