@inproceedings{99c80044a3544043adf64754e000cabd,
title = "Artificial Intelligence Measurement in Imaging-Based Overlay Metrology for Performance Boost",
abstract = "Advanced semiconductor devices target sub-2nm on-product overlay (OPO) and manufacturers utilize dense overlay (OVL) sampling and non-zero offset (NZO) control to enable such strict performance. Accurate optical OVL metrology systems with fast move-and-measurement (MAM) utilized at the after-develop inspection (ADI) step are required to support this OPO trend. This work presents an innovative Artificial Intelligence (AI) based, ultra-high-speed, overlay target focusing and centering approach on imaging-based overlay (IBO) measurements in the ADI step. The algorithm uses pre-trained image features and a deep learning model. The algorithm allows the measurement of every site across the wafer in its best centering and contrast focus position and thus overcomes intra-wafer process variations and enhanced measurement accuracy. The data will include results from multi-lot advanced DRAM process with basic performance analysis such as total measurement uncertainty (TMU), tool-to-tool matching (TTTM) and additional key performance indicators (KPIs).",
keywords = "Artificial Intelligence (AI), Data Analytics, Imaging-Based Overlay (IBO), Machine Learning (ML), On-Product Overlay (OPO), Overlay (OVL), Photolithography, Total Measurement Uncertainty (TMU)",
author = "Sveta Grechin and Shlomit Katz and Kei Maeda and Tsumugi Hirasawa and Hisashi Otsubo and Seigo Aoki and Atsushi Takahashi and Atsushi Miyafuji and Ofer Manos and Yu Yang and Tal Levinson and Ran Trifon and Dor Yehuda and Hamode Hegaze and Yuval Lamhot and Yair Vardi and Yoav Grauer and Avner Safrani and Cindy Kato and Iwata Yasuhisa and Imura Koichi and Ito Kosuke and Hayashi Masanobu and Eunjoong An and Nana Lan and Simon Ahn",
note = "Publisher Copyright: {\textcopyright} 2024 SPIE.; Metrology, Inspection, and Process Control XXXVIII 2024 ; Conference date: 26-02-2024 Through 29-02-2024",
year = "2024",
month = jan,
day = "1",
doi = "10.1117/12.3010281",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Sendelbach, {Matthew J.} and Schuch, {Nivea G.}",
booktitle = "Metrology, Inspection, and Process Control XXXVIII",
address = "United States",
}