Assessing the performance of two-dimensional dopant profiling techniques

N. Duhayon; P. Eyben; M. Fouchier; T. Clarysse; W. Vandervorst; D. Álvarez; S. Schoemann; M. Ciappa; M. Stangoni; W. Fichtner; P. Formanek; M. Kittler; V. Raineri; F. Giannazzo; D. Goghero; Y. Rosenwaks; R. Shikler; S. Saraf; S. Sadewasser; N. Barreau; T. Glatzel; M. Verheijen; S. A.M. Mentink; M. Von Sprekelsen; T. Maltezopoulos; R. Wiesendanger; L. Hellemans

doi:10.1116/1.1638775

Assessing the performance of two-dimensional dopant profiling techniques

N. Duhayon, P. Eyben, M. Fouchier, T. Clarysse, W. Vandervorst, D. Álvarez, S. Schoemann, M. Ciappa, M. Stangoni, W. Fichtner, P. Formanek, M. Kittler, V. Raineri, F. Giannazzo, D. Goghero, Y. Rosenwaks, R. Shikler, S. Saraf, S. Sadewasser, N. BarreauT. Glatzel, M. Verheijen, S. A.M. Mentink, M. Von Sprekelsen, T. Maltezopoulos, R. Wiesendanger, L. Hellemans

Research output: Contribution to journal › Article › peer-review

66 Scopus citations

Original language	English
Pages (from-to)	385-393
Number of pages	9
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	1
DOIs	https://doi.org/10.1116/1.1638775
State	Published - 1 Jan 2004
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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Duhayon, N., Eyben, P., Fouchier, M., Clarysse, T., Vandervorst, W., Álvarez, D., Schoemann, S., Ciappa, M., Stangoni, M., Fichtner, W., Formanek, P., Kittler, M., Raineri, V., Giannazzo, F., Goghero, D., Rosenwaks, Y., Shikler, R., Saraf, S., Sadewasser, S., ... Hellemans, L. (2004). Assessing the performance of two-dimensional dopant profiling techniques. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 22(1), 385-393. https://doi.org/10.1116/1.1638775

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Duhayon, N, Eyben, P, Fouchier, M, Clarysse, T, Vandervorst, W, Álvarez, D, Schoemann, S, Ciappa, M, Stangoni, M, Fichtner, W, Formanek, P, Kittler, M, Raineri, V, Giannazzo, F, Goghero, D, Rosenwaks, Y, Shikler, R, Saraf, S, Sadewasser, S, Barreau, N, Glatzel, T, Verheijen, M, Mentink, SAM, Von Sprekelsen, M, Maltezopoulos, T, Wiesendanger, R & Hellemans, L 2004, 'Assessing the performance of two-dimensional dopant profiling techniques', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 1, pp. 385-393. https://doi.org/10.1116/1.1638775

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AU - Duhayon, N.

AU - Eyben, P.

AU - Fouchier, M.

AU - Clarysse, T.

AU - Vandervorst, W.

AU - Álvarez, D.

AU - Schoemann, S.

AU - Ciappa, M.

AU - Stangoni, M.

AU - Fichtner, W.

AU - Formanek, P.

AU - Kittler, M.

AU - Raineri, V.

AU - Giannazzo, F.

AU - Goghero, D.

AU - Rosenwaks, Y.

AU - Shikler, R.

AU - Saraf, S.

AU - Sadewasser, S.

AU - Barreau, N.

AU - Glatzel, T.

AU - Verheijen, M.

AU - Mentink, S. A.M.

AU - Von Sprekelsen, M.

AU - Maltezopoulos, T.

AU - Wiesendanger, R.

AU - Hellemans, L.

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Assessing the performance of two-dimensional dopant profiling techniques

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