Assessing the performance of two-dimensional dopant profiling techniques

N. Duhayon; P. Eyben; M. Fouchier; T. Clarysse; W. Vandervorst; D. Álvarez; S. Schoemann; M. Ciappa; M. Stangoni; W. Fichtner; P. Formanek; M. Kittler; V. Raineri; F. Giannazzo; D. Goghero; Y. Rosenwaks; R. Shikler; S. Saraf; S. Sadewasser; N. Barreau; T. Glatzel; M. Verheijen; S. A.M. Mentink; M. Von Sprekelsen; T. Maltezopoulos; R. Wiesendanger; L. Hellemans

doi:10.1116/1.1638775

Assessing the performance of two-dimensional dopant profiling techniques

N. Duhayon
, P. Eyben
, M. Fouchier
, T. Clarysse
, W. Vandervorst
, D. Álvarez
, S. Schoemann
, M. Ciappa
, M. Stangoni
, W. Fichtner
, P. Formanek
, M. Kittler
, V. Raineri
, F. Giannazzo
, D. Goghero
, Y. Rosenwaks
, R. Shikler
, S. Saraf
, S. Sadewasser
, N. Barreau

T. Glatzel, M. Verheijen, S. A.M. Mentink, M. Von Sprekelsen, T. Maltezopoulos, R. Wiesendanger, L. Hellemans

Research output: Contribution to journal › Article › peer-review

67 Scopus citations

Original language	English
Pages (from-to)	385-393
Number of pages	9
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	1
DOIs	https://doi.org/10.1116/1.1638775
State	Published - 1 Jan 2004
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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Duhayon, N., Eyben, P., Fouchier, M., Clarysse, T., Vandervorst, W., Álvarez, D., Schoemann, S., Ciappa, M., Stangoni, M., Fichtner, W., Formanek, P., Kittler, M., Raineri, V., Giannazzo, F., Goghero, D., Rosenwaks, Y., Shikler, R., Saraf, S., Sadewasser, S., ... Hellemans, L. (2004). Assessing the performance of two-dimensional dopant profiling techniques. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, 22(1), 385-393. https://doi.org/10.1116/1.1638775

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title = "Assessing the performance of two-dimensional dopant profiling techniques",

author = "N. Duhayon and P. Eyben and M. Fouchier and T. Clarysse and W. Vandervorst and D. {\'A}lvarez and S. Schoemann and M. Ciappa and M. Stangoni and W. Fichtner and P. Formanek and M. Kittler and V. Raineri and F. Giannazzo and D. Goghero and Y. Rosenwaks and R. Shikler and S. Saraf and S. Sadewasser and N. Barreau and T. Glatzel and M. Verheijen and Mentink, \{S. A.M.\} and \{Von Sprekelsen\}, M. and T. Maltezopoulos and R. Wiesendanger and L. Hellemans",

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month = jan,

day = "1",

doi = "10.1116/1.1638775",

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Duhayon, N, Eyben, P, Fouchier, M, Clarysse, T, Vandervorst, W, Álvarez, D, Schoemann, S, Ciappa, M, Stangoni, M, Fichtner, W, Formanek, P, Kittler, M, Raineri, V, Giannazzo, F, Goghero, D, Rosenwaks, Y, Shikler, R, Saraf, S, Sadewasser, S, Barreau, N, Glatzel, T, Verheijen, M, Mentink, SAM, Von Sprekelsen, M, Maltezopoulos, T, Wiesendanger, R & Hellemans, L 2004, 'Assessing the performance of two-dimensional dopant profiling techniques', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 22, no. 1, pp. 385-393. https://doi.org/10.1116/1.1638775

TY - JOUR

T1 - Assessing the performance of two-dimensional dopant profiling techniques

AU - Duhayon, N.

AU - Eyben, P.

AU - Fouchier, M.

AU - Clarysse, T.

AU - Vandervorst, W.

AU - Álvarez, D.

AU - Schoemann, S.

AU - Ciappa, M.

AU - Stangoni, M.

AU - Fichtner, W.

AU - Formanek, P.

AU - Kittler, M.

AU - Raineri, V.

AU - Giannazzo, F.

AU - Goghero, D.

AU - Rosenwaks, Y.

AU - Shikler, R.

AU - Saraf, S.

AU - Sadewasser, S.

AU - Barreau, N.

AU - Glatzel, T.

AU - Verheijen, M.

AU - Mentink, S. A.M.

AU - Von Sprekelsen, M.

AU - Maltezopoulos, T.

AU - Wiesendanger, R.

AU - Hellemans, L.

PY - 2004/1/1

Y1 - 2004/1/1

UR - https://www.scopus.com/pages/publications/12144286205

U2 - 10.1116/1.1638775

DO - 10.1116/1.1638775

M3 - Article

AN - SCOPUS:12144286205

SN - 1071-1023

VL - 22

SP - 385

EP - 393

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 1

ER -

Assessing the performance of two-dimensional dopant profiling techniques

ASJC Scopus subject areas

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