Abstract
Tantalum was carburized using inductive radio-frequency plasma assisted chemical vapor deposition. The carburized layers were characterized and the surface properties were investigated. The treatment process was found to be efficient in improving the mechanical properties and chemical stability of tantalum. The carburizing process was governed by the conditions at the plasma-surface boundary: supply of atomic carbon, its surface saturation, solution in the metal, and diffusion towards the depth.
| Original language | English |
|---|---|
| Pages (from-to) | 2017-2022 |
| Number of pages | 6 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 18 |
| Issue number | 4 II |
| DOIs | |
| State | Published - 1 Jul 2000 |
| Event | 46th National Symposium of the American Vacuum Society - Seatlle, WA, USA Duration: 25 Oct 1999 → 29 Oct 1999 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films