Chemical bonding in microcrystalline Si:H:Cl films studied by ion-induced Auger Electron Spectroscopy

E. Grossman; A. Grill; M. Polak

doi:10.1016/0040-6090(89)90547-6

Chemical bonding in microcrystalline Si:H:Cl films studied by ion-induced Auger Electron Spectroscopy

E. Grossman, A. Grill, M. Polak

Department of Chemistry

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	L109-L114
Journal	Thin Solid Films
Volume	173
Issue number	1
DOIs	https://doi.org/10.1016/0040-6090(89)90547-6
State	Published - 1 Jun 1989

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Chemical bonding in microcrystalline Si:H:Cl films studied by ion-induced Auger Electron Spectroscopy",

author = "E. Grossman and A. Grill and M. Polak",

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T1 - Chemical bonding in microcrystalline Si:H:Cl films studied by ion-induced Auger Electron Spectroscopy

AU - Grossman, E.

AU - Grill, A.

AU - Polak, M.

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ER -

Chemical bonding in microcrystalline Si:H:Cl films studied by ion-induced Auger Electron Spectroscopy

ASJC Scopus subject areas

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