Chemical deposition and characterization of thorium-alloyed lead sulfide thin films

Moshiel Biton; Assaf Shamir; Michael Shandalov; Neta Arad-Vosk; Amir Sa'Ar; Eyal Yahel; Yuval Golan

doi:10.1016/j.tsf.2014.01.075

Chemical deposition and characterization of thorium-alloyed lead sulfide thin films

Moshiel Biton, Assaf Shamir, Michael Shandalov, Neta Arad-Vosk, Amir Sa'Ar, Eyal Yahel, Yuval Golan

Department of Materials Engineering

Research output: Contribution to journal › Article › peer-review

15 Scopus citations

Abstract

We present a chemical bath deposition process for alloying PbS thin films with ²³²Th, a stable isotope of thorium, to provide a model system for radiation damage studies. Variation of deposition parameters such as temperature, reagent concentrations and time allows controlling the properties of the resulting films. Small amounts of incorporated thorium (0.5%) strongly affected the surface topography and the orientation of the films and slowed down the growth rate. The Th appears to be incorporated as substitutional ions in the PbS lattice.

Original language	English
Pages (from-to)	223-229
Number of pages	7
Journal	Thin Solid Films
Volume	556
DOIs	https://doi.org/10.1016/j.tsf.2014.01.075
State	Published - 1 Apr 2014

Keywords

Chemical bath deposition
Lead chalcogenide alloys
Optical properties
Structural characterization

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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10.1016/j.tsf.2014.01.075

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title = "Chemical deposition and characterization of thorium-alloyed lead sulfide thin films",

abstract = "We present a chemical bath deposition process for alloying PbS thin films with 232Th, a stable isotope of thorium, to provide a model system for radiation damage studies. Variation of deposition parameters such as temperature, reagent concentrations and time allows controlling the properties of the resulting films. Small amounts of incorporated thorium (0.5%) strongly affected the surface topography and the orientation of the films and slowed down the growth rate. The Th appears to be incorporated as substitutional ions in the PbS lattice.",

keywords = "Chemical bath deposition, Lead chalcogenide alloys, Optical properties, Structural characterization",

author = "Moshiel Biton and Assaf Shamir and Michael Shandalov and Neta Arad-Vosk and Amir Sa'Ar and Eyal Yahel and Yuval Golan",

note = "Funding Information: Expert assistance from Dr. N. Froumin (XPS), Ms. Roxana Golan (AFM), Dr. V. Ezersky (TEM) and Dr. D. Mogilyanski (XRD) is gratefully acknowledged. Financial support was provided by the ICHE-IAEC foundation. This work has been partially supported by the Israel Science Foundation under Grant no. 1298/07 .",

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doi = "10.1016/j.tsf.2014.01.075",

language = "English",

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T1 - Chemical deposition and characterization of thorium-alloyed lead sulfide thin films

AU - Biton, Moshiel

AU - Shamir, Assaf

AU - Shandalov, Michael

AU - Arad-Vosk, Neta

AU - Sa'Ar, Amir

AU - Yahel, Eyal

AU - Golan, Yuval

N1 - Funding Information: Expert assistance from Dr. N. Froumin (XPS), Ms. Roxana Golan (AFM), Dr. V. Ezersky (TEM) and Dr. D. Mogilyanski (XRD) is gratefully acknowledged. Financial support was provided by the ICHE-IAEC foundation. This work has been partially supported by the Israel Science Foundation under Grant no. 1298/07 .

PY - 2014/4/1

Y1 - 2014/4/1

N2 - We present a chemical bath deposition process for alloying PbS thin films with 232Th, a stable isotope of thorium, to provide a model system for radiation damage studies. Variation of deposition parameters such as temperature, reagent concentrations and time allows controlling the properties of the resulting films. Small amounts of incorporated thorium (0.5%) strongly affected the surface topography and the orientation of the films and slowed down the growth rate. The Th appears to be incorporated as substitutional ions in the PbS lattice.

AB - We present a chemical bath deposition process for alloying PbS thin films with 232Th, a stable isotope of thorium, to provide a model system for radiation damage studies. Variation of deposition parameters such as temperature, reagent concentrations and time allows controlling the properties of the resulting films. Small amounts of incorporated thorium (0.5%) strongly affected the surface topography and the orientation of the films and slowed down the growth rate. The Th appears to be incorporated as substitutional ions in the PbS lattice.

KW - Chemical bath deposition

KW - Lead chalcogenide alloys

KW - Optical properties

KW - Structural characterization

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U2 - 10.1016/j.tsf.2014.01.075

DO - 10.1016/j.tsf.2014.01.075

M3 - Article

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VL - 556

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EP - 229

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Chemical deposition and characterization of thorium-alloyed lead sulfide thin films

Abstract

Keywords

ASJC Scopus subject areas

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