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Chemical vapor deposition of Ge on Si from GeH
4
-He gas mixtures
Herzl Aharoni
Department of Electrical & Computer Engineering
Research output
:
Contribution to journal
›
Letter
›
peer-review
5
Scopus citations
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4
-He gas mixtures'. Together they form a unique fingerprint.
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Keyphrases
Gas Mixture
100%
He Gas
100%
SiGe
100%
GeH4
100%
Chemical Vapor Deposition
100%
Preferred Orientation
50%
Occurence
50%
Si Substrate
50%
Growth Temperature
50%
Pyrolytic Decomposition
50%
Material Science
Gas Mixture
100%
Chemical Vapor Deposition
100%