Controlled Spacing between Nanopatterned Regions in Block Copolymer Films Obtained by Utilizing Substrate Topography for Local Film Thickness Differentiation

Elisheva Michman, Marcel Langenberg, Roland Stenger, Meirav Oded, Mark Schvartzman, Marcus Müller, Roy Shenhar

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

Abstract

Various types of devices require hierarchically nanopatterned substrates, where the spacing between patterned domains is controlled. Ultraconfined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns and thus opens numerous possibilities for the hierarchical construction of multifunctional devices.

Original languageEnglish
Pages (from-to)35247-35254
Number of pages8
JournalACS applied materials & interfaces
Volume11
Issue number38
DOIs
StatePublished - 25 Sep 2019

Keywords

  • block copolymer
  • directed self-assembly
  • thin film

ASJC Scopus subject areas

  • General Materials Science

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