Abstract
Experimental data and a theoretical model dealing with the morphology of the crystal-melt interface near grain boundaries of different types during silicon crystal growth by the edge-defined film-fed growth method are presented. The relationship between the morphology of the crystal-melt interface and the boundary crystallographic parameters (the grain misorientation, the boundary plane orientation, the crystallographic direction of growth for adjacent grains) is established.
Original language | English |
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Pages (from-to) | 115-119 |
Number of pages | 5 |
Journal | Journal of Crystal Growth |
Volume | 172 |
Issue number | 1-2 |
DOIs | |
State | Published - 1 Jan 1997 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry