Deposition and structural characterization of high quality textured C60 thin films

E. A. Katz, D. Faiman, S. Shtutina, A. Isakina

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Abstract

We present some features of the growth of C60 thin films on different substrates at temperatures up to 573 K. The crystalline structure of the films was studied by X-ray diffraction, atomic force microscopy and scanning tunneling microscopy. An effect of selective C60 deposition on an Ag/glass substrate held at 523-573 K is demonstrated. C60 was found to be deposited only on the glass part of the substrate but not on the part of the same substrate which had been predeposited with an Ag or Au layer. The potential use of such selective deposition for micro- and nanoscopic C60 pattering and fabrication of C60-based devices is suggested. We report, for the first time, on the possibility of extremely rapid (10-20 angstrom/s) growth of high quality 〈111〉-textured C60 films onto Ag and Au substrates held at 523-573 K using a simple vacuum deposition technique. Temperature-resolved XRD experiments revealed that textured C60 films undergo a first order phase transition at 250 K.

Original languageEnglish
Pages (from-to)49-54
Number of pages6
JournalThin Solid Films
Volume368
Issue number1
DOIs
StatePublished - 1 Jun 2000

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