Deposition of silicon carbide coatings on titanium alloy with a low pressure R.F. plasma

M. Katz; D. Itzhak; A. Grill; R. Avni

doi:10.1016/0040-6090(80)90538-6

Deposition of silicon carbide coatings on titanium alloy with a low pressure R.F. plasma

M. Katz, D. Itzhak, A. Grill, R. Avni

Department of Materials Engineering

Research output: Contribution to journal › Article › peer-review

23 Scopus citations

Abstract

A low pressure r.f. plasma was applied to deposit SiC coatings onto Ti6A14V substrates. The coatings were deposited onto substrates at temperatures of 140–390°C from a gas mixture of tetramethylsilane (TMS), argon and hydrogen. Scanning electron microscopy, X-ray diffraction and transmission electron microscopy were employed to identify and to characterize the coatings obtained. It was found that the coatings were hexagonal α-SiC of type III. The coating thickness approximately follows a parabolic time law. A maximum rate of deposition was observed in the pressure range 5–6 mbar. The rate of deposition increases with concentration of TMS up to 0.05% and remains approximately constant up to 0.12%

Original language	English
Pages (from-to)	497-502
Number of pages	6
Journal	Thin Solid Films
Volume	72
Issue number	3
DOIs	https://doi.org/10.1016/0040-6090(80)90538-6
State	Published - 1 Jan 1980

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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abstract = "A low pressure r.f. plasma was applied to deposit SiC coatings onto Ti6A14V substrates. The coatings were deposited onto substrates at temperatures of 140–390°C from a gas mixture of tetramethylsilane (TMS), argon and hydrogen. Scanning electron microscopy, X-ray diffraction and transmission electron microscopy were employed to identify and to characterize the coatings obtained. It was found that the coatings were hexagonal α-SiC of type III. The coating thickness approximately follows a parabolic time law. A maximum rate of deposition was observed in the pressure range 5–6 mbar. The rate of deposition increases with concentration of TMS up to 0.05% and remains approximately constant up to 0.12%",

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AU - Katz, M.

AU - Itzhak, D.

AU - Grill, A.

AU - Avni, R.

PY - 1980/1/1

Y1 - 1980/1/1

N2 - A low pressure r.f. plasma was applied to deposit SiC coatings onto Ti6A14V substrates. The coatings were deposited onto substrates at temperatures of 140–390°C from a gas mixture of tetramethylsilane (TMS), argon and hydrogen. Scanning electron microscopy, X-ray diffraction and transmission electron microscopy were employed to identify and to characterize the coatings obtained. It was found that the coatings were hexagonal α-SiC of type III. The coating thickness approximately follows a parabolic time law. A maximum rate of deposition was observed in the pressure range 5–6 mbar. The rate of deposition increases with concentration of TMS up to 0.05% and remains approximately constant up to 0.12%

AB - A low pressure r.f. plasma was applied to deposit SiC coatings onto Ti6A14V substrates. The coatings were deposited onto substrates at temperatures of 140–390°C from a gas mixture of tetramethylsilane (TMS), argon and hydrogen. Scanning electron microscopy, X-ray diffraction and transmission electron microscopy were employed to identify and to characterize the coatings obtained. It was found that the coatings were hexagonal α-SiC of type III. The coating thickness approximately follows a parabolic time law. A maximum rate of deposition was observed in the pressure range 5–6 mbar. The rate of deposition increases with concentration of TMS up to 0.05% and remains approximately constant up to 0.12%

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Deposition of silicon carbide coatings on titanium alloy with a low pressure R.F. plasma

Abstract

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