Deposition of silicon carbide coatings on titanium alloy with a low pressure R.F. plasma

M. Katz, D. Itzhak, A. Grill, R. Avni

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Abstract

A low pressure r.f. plasma was applied to deposit SiC coatings onto Ti6A14V substrates. The coatings were deposited onto substrates at temperatures of 140–390°C from a gas mixture of tetramethylsilane (TMS), argon and hydrogen. Scanning electron microscopy, X-ray diffraction and transmission electron microscopy were employed to identify and to characterize the coatings obtained. It was found that the coatings were hexagonal α-SiC of type III. The coating thickness approximately follows a parabolic time law. A maximum rate of deposition was observed in the pressure range 5–6 mbar. The rate of deposition increases with concentration of TMS up to 0.05% and remains approximately constant up to 0.12%

Original languageEnglish
Pages (from-to)497-502
Number of pages6
JournalThin Solid Films
Volume72
Issue number3
DOIs
StatePublished - 1 Jan 1980

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