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Diamond Film Deposition Using Microwave Plasmas Under Low Pressures
Y. H. Shing
, F. S. Pool
, D. H. Rich
Research output
:
Chapter in Book/Report/Conference proceeding
›
Chapter
›
peer-review
4
Scopus citations
Overview
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Dive into the research topics of 'Diamond Film Deposition Using Microwave Plasmas Under Low Pressures'. Together they form a unique fingerprint.
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Material Science
Film Deposition
100%
Diamond Films
100%
Luminescence
60%
Diamond
60%
Nucleation
40%
Film
20%
Plasma Deposition
20%
Crystallite
20%
Hydrogen
20%
Engineering
Diamond
100%
Microwave Plasma
100%
Torr
37%
Methane
25%
Deposition System
25%
Oxygen Concentration
12%
Resonance Mode
12%
Deposited Film
12%
Radio Frequency
12%
Si Substrate
12%
Substrate Temperature
12%
Cyclotron Resonance
12%
Crystallite
12%
Electron cyclotron resonance plasma
12%
Hydrogen
12%
Nitrogen
12%
Earth and Planetary Sciences
Diamond Films
100%
Methane
40%
Nucleation
40%
Cyclotron Resonance
40%
Radio Frequency
20%
Hydrogen Plasma
20%
Crystallite
20%
Nitrogen
20%
Physics
Diamond Films
100%
Nucleation
40%
Methane
40%
Electron Cyclotron Resonance
40%
Crystallite
20%
Hydrogen Plasma
20%
Nitrogen
20%
Keyphrases
Diamond Film Deposition
100%