Diffractive optical elements written by photodeposition

In this work direct laser writing of diffractive optical elements (DOE) by photodeposition (PD) of amorphous selenium (a-Se) from colloid solutions has been investigated. We used a computer controlled laser scanner for patterning thin film micro-profiles creating thus planar optical elements by direct beam writing on surfaces immersed in a liquid phase PD cell. The laser employed was an argon ion laser at 488 nm wavelength, with powers up to 55 mW, for writing typically 25-250 μm wide lines of 200 nm thickness at rates of about 150 μm/s. Various elements made of photodeposited thin films on polymethyl-methacrylate (PMMA) substrates were produced for prototyping microlenses, linear grating arrays, cylindrical and circular profiled DOE patterns.