Diffractive optical elements written by photodeposition

I. Baal-Zedaka, S. Hava, N. Mirchin, R. Margolin, M. Zagon, I. Lapsker, J. Azoulay, A. Peled

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


In this work direct laser writing of diffractive optical elements (DOE) by photodeposition (PD) of amorphous selenium (a-Se) from colloid solutions has been investigated. We used a computer controlled laser scanner for patterning thin film micro-profiles creating thus planar optical elements by direct beam writing on surfaces immersed in a liquid phase PD cell. The laser employed was an argon ion laser at 488 nm wavelength, with powers up to 55 mW, for writing typically 25-250 μm wide lines of 200 nm thickness at rates of about 150 μm/s. Various elements made of photodeposited thin films on polymethyl-methacrylate (PMMA) substrates were produced for prototyping microlenses, linear grating arrays, cylindrical and circular profiled DOE patterns.

Original languageEnglish
Pages (from-to)226-232
Number of pages7
JournalApplied Surface Science
Issue number1
StatePublished - 15 Mar 2003


  • Diffractive optical elements
  • Optical gratings
  • Optical microelements
  • Photodeposition


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