Dual response surface optimization using a process “capability” index

Michael Bendersky, Noam Barak, Yisrael Parmet

Research output: Contribution to journalArticlepeer-review

1 Scopus citations


Dual Response Surface Methodology is a powerful tool for simultaneously optimizing the mean and the variance of a quality characteristic in the field of quality engineering. The optimization of dual response systems to achieve better quality has played a major role in the design of industrial products and processes. In this paper we suggest using a process capability index - Cpk - as the objective function. We show by ways of multiple examples that this method improves the obtained yield of a process for different response variable types.

Original languageEnglish
Pages (from-to)7006-7020
Number of pages15
JournalCommunications in Statistics - Theory and Methods
Issue number20
StatePublished - 1 Jan 2022


  • Yield maximization
  • process capability index
  • process improvement
  • robust design

ASJC Scopus subject areas

  • Statistics and Probability


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