Effective utilization (Ue) - A breakthrough performance indicator for machine efficiency improvement

Peter Lopez, Adam Terry, David Daniely, Adar Kalir

Research output: Contribution to journalConference articlepeer-review

3 Scopus citations

Abstract

In today's high stakes semiconductor industry, cost accounting demands high machine utilization and world class throughput time. The greater the utilization of capital equipment, the greater the return on investment[1]. One of the major challenges facing most manufacturing facilities has been the inability to sustain world class equipment utilization and factory throughput time[2]. This paper will detail how, through a Breakthrough System called Effective Utilization (Ue), major advances in achieving higher predictable utilization and increased WIP velocity were made in both 200mm and 300mm Intel manufacturing facilities.

Original languageEnglish
Article numberMC110
Pages (from-to)63-66
Number of pages4
JournalIEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
DOIs
StatePublished - 1 Jan 2005
Externally publishedYes
EventIEEE International Symposium on Semiconductor Manufacturing, Conference Proceedings - San Jose, CA, United States
Duration: 13 Sep 200515 Sep 2005

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Engineering (all)
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Effective utilization (Ue) - A breakthrough performance indicator for machine efficiency improvement'. Together they form a unique fingerprint.

Cite this