Electrodiffusion phenomena in C60 thin films

E. A. Katz, D. Faiman, S. M. Tuladhar, S. Shtutina, N. Froumin, M. Polak

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

As part of our ongoing research program to produce semiconductor devices based on C60 thin films, we report here on our first attempts at the intercalative doping of C60 thin films through the diffusion of metals. Two techniques were employed: (a) chemically induced counter electrodiffusion of Cu and I2 into a C60 matrix and (b) Au diffusion under the action of an external electric field.

Original languageEnglish
Pages (from-to)493-496
Number of pages4
JournalPhysics of the Solid State
Volume44
Issue number3
DOIs
StatePublished - 1 Mar 2002

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