Electroless Deposited Nickel Thin Films Alloyed with Thorium

Ilan Schapiro; Michael Shandalov; Nitzan Maman; Vladimir Ezersky; Yuval Golan; Eyal Yahel

doi:10.1002/crat.202100194

Electroless Deposited Nickel Thin Films Alloyed with Thorium

Ilan Schapiro, Michael Shandalov, Nitzan Maman, Vladimir Ezersky, Yuval Golan, Eyal Yahel

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

Ni thin films alloyed with ²³²Th are obtained using electroless bath deposition by optimization of solution composition and deposition temperature. X-ray photoelectron spectroscopy and transmission electron microscopy (TEM) indicate a fairly homogenous distribution of ²³²Th, with considerable amounts of incorporated oxygen. TEM confirms the presence of crystalline films with low concentrations of nickel phosphide precipitates for both non-alloyed Ni and Ni─Th films.

Original language	English
Article number	2100194
Journal	Crystal Research and Technology
Volume	57
Issue number	8
DOIs	https://doi.org/10.1002/crat.202100194
State	Published - 1 Aug 2022

Keywords

Ni(P) thin films
acetate additives
citrate additives
electroless deposition
microstructures
thorium alloying

ASJC Scopus subject areas

General Chemistry
General Materials Science
Condensed Matter Physics

Access to Document

10.1002/crat.202100194

Cite this

@article{04b6c5418b0545c8adacd1ee761a4aab,

title = "Electroless Deposited Nickel Thin Films Alloyed with Thorium",

abstract = "Ni thin films alloyed with 232Th are obtained using electroless bath deposition by optimization of solution composition and deposition temperature. X-ray photoelectron spectroscopy and transmission electron microscopy (TEM) indicate a fairly homogenous distribution of 232Th, with considerable amounts of incorporated oxygen. TEM confirms the presence of crystalline films with low concentrations of nickel phosphide precipitates for both non-alloyed Ni and Ni─Th films.",

keywords = "Ni(P) thin films, acetate additives, citrate additives, electroless deposition, microstructures, thorium alloying",

author = "Ilan Schapiro and Michael Shandalov and Nitzan Maman and Vladimir Ezersky and Yuval Golan and Eyal Yahel",

note = "Publisher Copyright: {\textcopyright} 2022 Wiley-VCH GmbH.",

year = "2022",

month = aug,

day = "1",

doi = "10.1002/crat.202100194",

language = "English",

volume = "57",

journal = "Crystal Research and Technology",

issn = "0232-1300",

publisher = "John Wiley and Sons Inc.",

number = "8",

}

TY - JOUR

T1 - Electroless Deposited Nickel Thin Films Alloyed with Thorium

AU - Schapiro, Ilan

AU - Shandalov, Michael

AU - Maman, Nitzan

AU - Ezersky, Vladimir

AU - Golan, Yuval

AU - Yahel, Eyal

PY - 2022/8/1

Y1 - 2022/8/1

N2 - Ni thin films alloyed with 232Th are obtained using electroless bath deposition by optimization of solution composition and deposition temperature. X-ray photoelectron spectroscopy and transmission electron microscopy (TEM) indicate a fairly homogenous distribution of 232Th, with considerable amounts of incorporated oxygen. TEM confirms the presence of crystalline films with low concentrations of nickel phosphide precipitates for both non-alloyed Ni and Ni─Th films.

AB - Ni thin films alloyed with 232Th are obtained using electroless bath deposition by optimization of solution composition and deposition temperature. X-ray photoelectron spectroscopy and transmission electron microscopy (TEM) indicate a fairly homogenous distribution of 232Th, with considerable amounts of incorporated oxygen. TEM confirms the presence of crystalline films with low concentrations of nickel phosphide precipitates for both non-alloyed Ni and Ni─Th films.

KW - Ni(P) thin films

KW - acetate additives

KW - citrate additives

KW - electroless deposition

KW - microstructures

KW - thorium alloying

UR - http://www.scopus.com/inward/record.url?scp=85128350792&partnerID=8YFLogxK

U2 - 10.1002/crat.202100194

DO - 10.1002/crat.202100194

M3 - Article

AN - SCOPUS:85128350792

SN - 0232-1300

VL - 57

JO - Crystal Research and Technology

JF - Crystal Research and Technology

IS - 8

M1 - 2100194

ER -

Electroless Deposited Nickel Thin Films Alloyed with Thorium

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this