Electrophoretic Deposition of Carbon Nitride Layers for Photoelectrochemical Applications

Jingsan Xu; Menny Shalom

doi:10.1021/acsami.6b02853

Electrophoretic Deposition of Carbon Nitride Layers for Photoelectrochemical Applications

Jingsan Xu, Menny Shalom

Research output: Contribution to journal › Article › peer-review

74 Scopus citations

Abstract

Electrophoretic deposition (EPD) is used for the growth of carbon nitride (C₃N₄) layers on conductive substrates. EPD is fast, environmentally friendly, and allows the deposition of negatively charged C₃N₄ with different compositions and chemical properties. In this method, C₃N₄ can be deposited on various conductive substrates ranging from conductive glass and carbon paper to nickel foam possessing complex 3D geometries. The high flexibility of this approach enables us to readily tune the photophysical and photoelectronic properties of the C₃N₄ electrodes. The advantage of this method was further illustrated by the tailored construction of a heterostructure between two complementary C₃N₄, with marked photoelectrochemical activity.

Original language	English
Pages (from-to)	13058-13063
Number of pages	6
Journal	ACS Applied Materials and Interfaces
Volume	8
Issue number	20
DOIs	https://doi.org/10.1021/acsami.6b02853
State	Published - 25 May 2016
Externally published	Yes

Keywords

carbon nitride electrodes
electrophoretic deposition
heterostructures
photoelectrochemistry
water oxidation

ASJC Scopus subject areas

General Materials Science

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10.1021/acsami.6b02853

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title = "Electrophoretic Deposition of Carbon Nitride Layers for Photoelectrochemical Applications",

abstract = "Electrophoretic deposition (EPD) is used for the growth of carbon nitride (C3N4) layers on conductive substrates. EPD is fast, environmentally friendly, and allows the deposition of negatively charged C3N4 with different compositions and chemical properties. In this method, C3N4 can be deposited on various conductive substrates ranging from conductive glass and carbon paper to nickel foam possessing complex 3D geometries. The high flexibility of this approach enables us to readily tune the photophysical and photoelectronic properties of the C3N4 electrodes. The advantage of this method was further illustrated by the tailored construction of a heterostructure between two complementary C3N4, with marked photoelectrochemical activity.",

keywords = "carbon nitride electrodes, electrophoretic deposition, heterostructures, photoelectrochemistry, water oxidation",

author = "Jingsan Xu and Menny Shalom",

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AU - Shalom, Menny

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N2 - Electrophoretic deposition (EPD) is used for the growth of carbon nitride (C3N4) layers on conductive substrates. EPD is fast, environmentally friendly, and allows the deposition of negatively charged C3N4 with different compositions and chemical properties. In this method, C3N4 can be deposited on various conductive substrates ranging from conductive glass and carbon paper to nickel foam possessing complex 3D geometries. The high flexibility of this approach enables us to readily tune the photophysical and photoelectronic properties of the C3N4 electrodes. The advantage of this method was further illustrated by the tailored construction of a heterostructure between two complementary C3N4, with marked photoelectrochemical activity.

AB - Electrophoretic deposition (EPD) is used for the growth of carbon nitride (C3N4) layers on conductive substrates. EPD is fast, environmentally friendly, and allows the deposition of negatively charged C3N4 with different compositions and chemical properties. In this method, C3N4 can be deposited on various conductive substrates ranging from conductive glass and carbon paper to nickel foam possessing complex 3D geometries. The high flexibility of this approach enables us to readily tune the photophysical and photoelectronic properties of the C3N4 electrodes. The advantage of this method was further illustrated by the tailored construction of a heterostructure between two complementary C3N4, with marked photoelectrochemical activity.

KW - carbon nitride electrodes

KW - electrophoretic deposition

KW - heterostructures

KW - photoelectrochemistry

KW - water oxidation

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ER -

Electrophoretic Deposition of Carbon Nitride Layers for Photoelectrochemical Applications

Abstract

Keywords

ASJC Scopus subject areas

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