TY - GEN
T1 - Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist
AU - Eisenberg, Naftali P.
AU - Manevich, M.
AU - Klebanov, M.
AU - Shutina, S.
AU - Lyubin, V.
PY - 1995/12/1
Y1 - 1995/12/1
N2 - Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.
AB - Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.
UR - http://www.scopus.com/inward/record.url?scp=0029490529&partnerID=8YFLogxK
M3 - Conference contribution
AN - SCOPUS:0029490529
SN - 0819417742
SN - 9780819417749
T3 - Proceedings of SPIE - The International Society for Optical Engineering
SP - 235
EP - 241
BT - Proceedings of SPIE - The International Society for Optical Engineering
T2 - 9th Meeting on Optical Engineering in Israel
Y2 - 24 October 1994 through 26 October 1994
ER -