Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist

Naftali P. Eisenberg; M. Manevich; M. Klebanov; S. Shutina; V. Lyubin

Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist

Naftali P. Eisenberg, M. Manevich, M. Klebanov, S. Shutina, V. Lyubin

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

13 Scopus citations

Abstract

Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.

Original language	English
Title of host publication	Proceedings of SPIE - The International Society for Optical Engineering
Pages	235-241
Number of pages	7
State	Published - 1 Dec 1995
Externally published	Yes
Event	9th Meeting on Optical Engineering in Israel - Tel-Aviv, Isr Duration: 24 Oct 1994 → 26 Oct 1994

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	2426
ISSN (Print)	0277-786X

Conference

Conference	9th Meeting on Optical Engineering in Israel
City	Tel-Aviv, Isr
Period	24/10/94 → 26/10/94

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Cite this

@inproceedings{7a703ad6e8e247acbc8d5502f060c7fe,

title = "Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist",

abstract = "Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.",

author = "Eisenberg, {Naftali P.} and M. Manevich and M. Klebanov and S. Shutina and V. Lyubin",

year = "1995",

month = dec,

day = "1",

language = "English",

isbn = "0819417742",

series = "Proceedings of SPIE - The International Society for Optical Engineering",

pages = "235--241",

booktitle = "Proceedings of SPIE - The International Society for Optical Engineering",

note = "9th Meeting on Optical Engineering in Israel ; Conference date: 24-10-1994 Through 26-10-1994",

}

Eisenberg, NP, Manevich, M, Klebanov, M, Shutina, S & Lyubin, V 1995, Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist. in Proceedings of SPIE - The International Society for Optical Engineering. Proceedings of SPIE - The International Society for Optical Engineering, vol. 2426, pp. 235-241, 9th Meeting on Optical Engineering in Israel, Tel-Aviv, Isr, 24/10/94.

Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist. / Eisenberg, Naftali P.; Manevich, M.; Klebanov, M. et al.
Proceedings of SPIE - The International Society for Optical Engineering. 1995. p. 235-241 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 2426).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

TY - GEN

T1 - Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist

AU - Eisenberg, Naftali P.

AU - Manevich, M.

AU - Klebanov, M.

AU - Shutina, S.

AU - Lyubin, V.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.

AB - Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.

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M3 - Conference contribution

AN - SCOPUS:0029490529

SN - 0819417742

SN - 9780819417749

T3 - Proceedings of SPIE - The International Society for Optical Engineering

SP - 235

EP - 241

BT - Proceedings of SPIE - The International Society for Optical Engineering

T2 - 9th Meeting on Optical Engineering in Israel

Y2 - 24 October 1994 through 26 October 1994

ER -

Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist

Abstract

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ASJC Scopus subject areas

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