Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist

Naftali P. Eisenberg, M. Manevich, M. Klebanov, S. Shutina, V. Lyubin

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

5 Scopus citations

Abstract

Micro-optical elements, particularly microlenses, are finding growing application in different fields of modern optoelectronics. One of the most promising methods of microlens fabrication is based on photolithographic processes. Organic photoresists were used in the earlier development of microlens arrays. A new technique of microlens fabrication using inorganic chalcogenide photoresists is presented. Such photoresists have many advantages, such as very high resolution, photosensitivity in wide spectral range, high values of refractive index, transparency in the IR range, and the ability to be used as positive or negative resists depending on the developer used. These unique properties create new possibilities for the development of microlens arrays in the IR.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Pages235-241
Number of pages7
StatePublished - 1 Dec 1995
Externally publishedYes
Event9th Meeting on Optical Engineering in Israel - Tel-Aviv, Isr
Duration: 24 Oct 199426 Oct 1994

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2426
ISSN (Print)0277-786X

Conference

Conference9th Meeting on Optical Engineering in Israel
CityTel-Aviv, Isr
Period24/10/9426/10/94

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Fabrication of microlens array for the IR by lithographic processes using an inorganic chalcogenide photoresist'. Together they form a unique fingerprint.

Cite this