Fabrication of polymeric photonic structures using dip-pen nanolithography

Zeev Fradkin; Marcos Roitman; Amos Bardea; Roy Avrahamy; Yeoshua Bery; Hanan Ohana; Moshe Zohar

doi:10.1117/1.JMM.19.1.013501

Fabrication of polymeric photonic structures using dip-pen nanolithography

Zeev Fradkin, Marcos Roitman, Amos Bardea, Roy Avrahamy, Yeoshua Bery, Hanan Ohana, Moshe Zohar

Department of Electrical & Computer Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.

Original language	English
Article number	013501
Journal	Journal of Micro/ Nanolithography, MEMS, and MOEMS
Volume	19
Issue number	1
DOIs	https://doi.org/10.1117/1.JMM.19.1.013501
State	Published - 1 Jan 2020

Keywords

Dip-pen nanolithography
Phase mask
Pv cell

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Mechanical Engineering
Electrical and Electronic Engineering

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1117/1.JMM.19.1.013501

Cite this

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abstract = "Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.",

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AU - Roitman, Marcos

AU - Bardea, Amos

AU - Avrahamy, Roy

AU - Bery, Yeoshua

AU - Ohana, Hanan

AU - Zohar, Moshe

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AB - Dip-pen nanolithography (DPN) is a low-cost, versatile, bench-top technology for direct patterning of materials over surfaces. Our study reports on the production of two-dimensional optical grating nanostructures based on polymers, using DPN. The influence of both the ink composition and the dwell time were investigated. Prototypes of phase masks were manufactured, and their main characteristics were analyzed. The results in our work may contribute to improving the fabrication process of optical structures, including the production of microlenses with controlled focal length.

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KW - Phase mask

KW - Pv cell

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Fabrication of polymeric photonic structures using dip-pen nanolithography

Abstract

Keywords

ASJC Scopus subject areas

UN SDGs

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