Femtosecond laser crystallization of boron-doped amorphous hydrogenated silicon films

Keyphrases

• Boron Doping 100%
• Amorphous Hydrogenated Silicon Film 100%
• Femtosecond Laser Crystallization 100%
• Amorphous Crystallization 33%
• Electrical Properties 33%
• Crystallization Process 33%
• Activation Energy 33%
• Crystalline Phase 33%
• Temperature-dependent Thermal Conductivity 33%
• Femtosecond Laser Pulses 33%
• Laser Therapy 33%
• Electric Properties 33%
• Doping Efficiency 33%
• Photoelectric Properties 33%
• Silicon Film 33%
• Crystal Fractionation 33%
• Femtosecond Laser Irradiation 33%
• Nanocrystalline Silicon 33%

Material Science

• Film 100%
• Amorphous Silicon 100%
• Boron 100%
• Crystalline Material 40%
• Silicon 20%
• Activation Energy 20%
• Crystallization 20%
• Photovoltaics 20%
• Volume Fraction 20%
• Laser Pulse 20%
• Nanocrystalline Silicon 20%

Engineering

• Femtosecond Laser 100%
• Hydrogenated Amorphous Silicon 100%
• Film Silicon 33%
• Activation Energy 33%
• Nanocrystalline 33%
• Temperature Dependence 33%
• Photovoltaics 33%
• Laser Irradiation 33%
• Crystalline Phase 33%
• Femtosecond Laser Pulse 33%