Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography

M. Schvartzman; A. Mathur; Y. Kang; C. Jahnes; J. Hone; S. J. Wind

doi:10.1116/1.3013281

Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography

M. Schvartzman
, A. Mathur
, Y. Kang
, C. Jahnes
, J. Hone
, S. J. Wind

Research output: Contribution to journal › Article › peer-review

21 Scopus citations

Abstract

Nanoimprint templates were fabricated from diamondlike carbon (DLC) films grown on Si, using negative-tone e-beam lithography and oxygen plasma etching. An antiadhesion coating was provided through fluorocarbon-based plasma treatment, which was found to form a Teflon-like thin layer on the treated DLC surface. The fluorinated templates were used to imprint arrays of dots with diameters down to 10 nm in polymethyl-methacrylate. Application of the fluorocarbon plasma treatment was also demonstrated in the antiadhesion treatment of the nanoimprint resist and in elastomer molding.

Original language	English
Pages (from-to)	2394-2398
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	26
Issue number	6
DOIs	https://doi.org/10.1116/1.3013281
State	Published - 11 Dec 2008
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.3013281

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title = "Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography",

abstract = "Nanoimprint templates were fabricated from diamondlike carbon (DLC) films grown on Si, using negative-tone e-beam lithography and oxygen plasma etching. An antiadhesion coating was provided through fluorocarbon-based plasma treatment, which was found to form a Teflon-like thin layer on the treated DLC surface. The fluorinated templates were used to imprint arrays of dots with diameters down to 10 nm in polymethyl-methacrylate. Application of the fluorocarbon plasma treatment was also demonstrated in the antiadhesion treatment of the nanoimprint resist and in elastomer molding.",

author = "M. Schvartzman and A. Mathur and Y. Kang and C. Jahnes and J. Hone and Wind, \{S. J.\}",

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T1 - Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography

AU - Schvartzman, M.

AU - Mathur, A.

AU - Kang, Y.

AU - Jahnes, C.

AU - Hone, J.

AU - Wind, S. J.

PY - 2008/12/11

Y1 - 2008/12/11

N2 - Nanoimprint templates were fabricated from diamondlike carbon (DLC) films grown on Si, using negative-tone e-beam lithography and oxygen plasma etching. An antiadhesion coating was provided through fluorocarbon-based plasma treatment, which was found to form a Teflon-like thin layer on the treated DLC surface. The fluorinated templates were used to imprint arrays of dots with diameters down to 10 nm in polymethyl-methacrylate. Application of the fluorocarbon plasma treatment was also demonstrated in the antiadhesion treatment of the nanoimprint resist and in elastomer molding.

AB - Nanoimprint templates were fabricated from diamondlike carbon (DLC) films grown on Si, using negative-tone e-beam lithography and oxygen plasma etching. An antiadhesion coating was provided through fluorocarbon-based plasma treatment, which was found to form a Teflon-like thin layer on the treated DLC surface. The fluorinated templates were used to imprint arrays of dots with diameters down to 10 nm in polymethyl-methacrylate. Application of the fluorocarbon plasma treatment was also demonstrated in the antiadhesion treatment of the nanoimprint resist and in elastomer molding.

UR - https://www.scopus.com/pages/publications/57249094069

U2 - 10.1116/1.3013281

DO - 10.1116/1.3013281

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SN - 1071-1023

VL - 26

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JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography

Abstract

ASJC Scopus subject areas

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