Gap micro-lithography for chalcogenide micro-lens array fabrication

M. Manevich, M. Klebanov, V. Lyubin, J. Varshal, J. Broder, N. P. Eisenberg

Research output: Contribution to journalArticlepeer-review

10 Scopus citations

Abstract

A newly developed technique, gap micro-lithography, used for the formation of I.R. micro-optical devices such as micro-lens arrays with a very long focal length, is described. The use of a three-component As-S-Se photoresist with a new efficient amine-based selective developer allows for the realization of soft contrast characteristics of the microlithographic process with a Xe-light source. Parameters and characteristics of microoptical devices made using the gap micro-lithography method are discussed.

Original languageEnglish
Pages (from-to)61-64
Number of pages4
JournalChalcogenide Letters
Volume5
Issue number4
StatePublished - 1 Jan 2008

Keywords

  • Chalcogenide glassy film
  • Chalcogenide photoresist
  • Gap micro-lithography
  • Micro-lens array

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Chemistry (all)
  • Physics and Astronomy (all)

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