Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography

A. Arsh; M. Klebanov; V. Lyubin; L. Shapiro; A. Feigel; M. Veinger; B. Sfez

doi:10.1016/j.optmat.2003.12.013

Glassy mAs₂S₃·nAs₂Se₃ photoresist films for interference laser lithography

A. Arsh, M. Klebanov, V. Lyubin, L. Shapiro, A. Feigel, M. Veinger, B. Sfez

Department of Physics

Research output: Contribution to journal › Article › peer-review

30 Scopus citations

Abstract

Spectra of refractive index and selective dissolution of several glassy mAs₂S₃·nAs₂Se₃ films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar⁺-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.

Original language	English
Pages (from-to)	301-304
Number of pages	4
Journal	Optical Materials
Volume	26
Issue number	3
DOIs	https://doi.org/10.1016/j.optmat.2003.12.013
State	Published - 1 Jan 2004

Keywords

Chalcogenide glassy films
Interference laser lithography
Photonic crystals
Spectra of refractive index

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Computer Science (all)
Atomic and Molecular Physics, and Optics
Spectroscopy
Physical and Theoretical Chemistry
Organic Chemistry
Inorganic Chemistry
Electrical and Electronic Engineering

Access to Document

10.1016/j.optmat.2003.12.013

Cite this

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title = "Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography",

abstract = "Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.",

keywords = "Chalcogenide glassy films, Interference laser lithography, Photonic crystals, Spectra of refractive index",

author = "A. Arsh and M. Klebanov and V. Lyubin and L. Shapiro and A. Feigel and M. Veinger and B. Sfez",

note = "Funding Information: This work was partially supported by the Israel Ministry of Science.",

year = "2004",

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doi = "10.1016/j.optmat.2003.12.013",

language = "English",

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T1 - Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography

AU - Arsh, A.

AU - Klebanov, M.

AU - Lyubin, V.

AU - Shapiro, L.

AU - Feigel, A.

AU - Veinger, M.

AU - Sfez, B.

N1 - Funding Information: This work was partially supported by the Israel Ministry of Science.

PY - 2004/1/1

Y1 - 2004/1/1

N2 - Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.

AB - Spectra of refractive index and selective dissolution of several glassy mAs2S3·nAs2Se3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar+-, He-Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.

KW - Chalcogenide glassy films

KW - Interference laser lithography

KW - Photonic crystals

KW - Spectra of refractive index

UR - http://www.scopus.com/inward/record.url?scp=3042719121&partnerID=8YFLogxK

U2 - 10.1016/j.optmat.2003.12.013

DO - 10.1016/j.optmat.2003.12.013

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EP - 304

JO - Optical Materials

JF - Optical Materials

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