Keyphrases
TiAlN
100%
Electron Cyclotron Resonance
100%
Reactive Sputtering
100%
Adhesion
40%
Failure Load
40%
Optical Emission Spectroscopy
40%
Radio Frequency
20%
Vickers Hardness
20%
Crystalline Structure
20%
Mechanical Properties
20%
Gas Phase
20%
Compositional Properties
20%
Rutile
20%
Microhardness
20%
Structure Composition
20%
Structure-property Relationships
20%
Substrate Bias Voltage
20%
Deposition Process
20%
Feed Composition
20%
Processing Parameters
20%
Auger Electron Spectroscopy
20%
Variable Combination
20%
Power Input
20%
Contrast Effect
20%
Amorphous Structure
20%
Aluminum Species
20%
Random Structure
20%
Ti Concentration
20%
Radio Frequency Plasma
20%
Microwave Excitation
20%
Adhesion Failure
20%
Al Concentration
20%
Argon Flow
20%
Magnetron Target
20%
Dual-cathode
20%
Scratch Tester
20%
Input Bias
20%
Substrate Voltage
20%
Graded Layer
20%
X-ray Diffractometer
20%
Flow Formation
20%
Engineering
Reactive Sputtering
100%
Cyclotron Resonance
100%
Radio Frequency
40%
Substrate Bias
40%
Failure Load
40%
Microhardness
40%
Vickers
20%
Gas-Phase
20%
Bias Voltage
20%
Deposition Process
20%
Processing Parameter
20%
Power Input
20%
Magnetron
20%
Feed Composition
20%
Adhesion Range
20%
Graded Layer
20%
Material Science
Microhardness
100%
Emission Spectroscopy
100%
Cathode
50%
Crystal Structure
50%
Structure (Composition)
50%
Aluminum
50%
Titanium
50%
Auger Electron Spectroscopy
50%
Amorphous Material
50%