Abstract
High-quality PbTe films have been grown on vicinal Si(1 1 1) using both stacked BaF2-CaF2 buffers and single BaF2 layers deposited directly on Si by the two-step growth method. Unlike on exactly oriented Si(1 1 1), the surface morphology of PbTe grown on vicinal Si(1 1 1) was undulated due to bunched steps on the BaF2 surface. The BaF2 buffer layers and the PbTe films grown on Si(1 0 0) consist of domains rotated by 90° and 180° around the normal to the surface, with the (1 1 1) BaF2 and the (1 1 1) PbTe planes parallel to the (1 0 0) Si plane. Although the PbTe films grown on Si(1 0 0) have domain structures, the mobility of carriers at 300 K is the same as in PbTe films grown on Si(1 1 1) and these heterostructures are capable of relieving the thermal mismatch strain.
Original language | English |
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Pages (from-to) | 1216-1221 |
Number of pages | 6 |
Journal | Journal of Crystal Growth |
Volume | 198-199 |
Issue number | pt 2 |
DOIs | |
State | Published - 1 Jan 1999 |
Event | Proceedings of the 1998 10th International Conference on Vapor Growth and Epitaxy and Specialist Workshops on Crystal Growth, ICVGE-10 - Jerusalem, Isr Duration: 26 Jul 1998 → 31 Jul 1998 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Inorganic Chemistry
- Materials Chemistry