Highly reliable gate oxidation using catalytic water vapor generator (WVG) for MOS device fabrication

Takeshi Ohkawa, Osamu Nakamura, Herzl Aharoni, Tadahiro Ohmi

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Fingerprint

Dive into the research topics of 'Highly reliable gate oxidation using catalytic water vapor generator (WVG) for MOS device fabrication'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds