Abstract
The kinetics of accumulation of hydrogen on clean and on oxidized uranium surfaces was studied by combined direct recoil spectrometry (DRS), Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) techniques. For the sputter-cleaned surface an island growth progression characterizes the accumulation kinetics of hydrogen, whereas on the oxidized surface a random two-site Langmuir model seems to fit the initial chemisorption process. Similar combined DRS and AES measurements were applied to study the kinetics of accumulation of oxygen on H2 predosed uranium as compared to the clean (H-free) case. The pre-chemisorption of hydrogen modifies the mechanism of oxygen incorporation and the structure of the product overlayer.
Original language | English |
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Pages (from-to) | 607-620 |
Number of pages | 14 |
Journal | Surface Science |
Volume | 223 |
Issue number | 3 |
DOIs | |
State | Published - 2 Dec 1989 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry