Abstract
The microstructure and composition of the interfacial layer between chemically deposited PbSe and GaAs substrates were studied using high-resolution transmission electron microscopy (HRTEM), Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS) and energy-filtered TEM. The thickness of the interfacial layer varied significantly from direct contact of the film with the substrate to 5 nm in the thickest regions. The results established the presence of a discontinuous, amorphous intermediate layer of Ga 2O3 at the PbSe/GaAs interface.
Original language | English |
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Pages (from-to) | 939-943 |
Number of pages | 5 |
Journal | Surface and Interface Analysis |
Volume | 40 |
Issue number | 5 |
DOIs | |
State | Published - 1 May 2008 |
Keywords
- Chemical deposition
- Composition
- GaAs
- Interface
- Microstructure
- PbSe
ASJC Scopus subject areas
- General Chemistry
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry