Investigation of TiN/TiSi2 bilayer thin films on Si (100) substrate

Y. Shor; J. Pelleg

Investigation of TiN/TiSi₂ bilayer thin films on Si (100) substrate

Y. Shor, J. Pelleg

Department of Materials Engineering

Research output: Contribution to journal › Conference article › peer-review

4 Scopus citations

Abstract

The conditions of forming a bi-layer structure of TiN/TiSi₂ thin film on Si (100) substrate is studied. For this purpose two techniques of producing this structure were applied: (1) deposition of Ti on Si (100), followed by reactive sputtering to obtain TiN on top of this layer and (b) codeposition of Ti and Si on Si (100) and then deposition of TiN by reactive sputtering. Reactive sputtering was carried out in a mixture of N₂/Ar with 20% N₂. Using X-ray diffraction techniques, the structure of the specimens was analyzed.

Original language	English
Pages (from-to)	107-112
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	402
State	Published - 1 Jan 1996
Event	Proceedings of the 1995 MRS Fall Symposium - Boston, MA, USA Duration: 27 Nov 1995 → 30 Nov 1995

ASJC Scopus subject areas

General Materials Science
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

Cite this

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title = "Investigation of TiN/TiSi2 bilayer thin films on Si (100) substrate",

abstract = "The conditions of forming a bi-layer structure of TiN/TiSi2 thin film on Si (100) substrate is studied. For this purpose two techniques of producing this structure were applied: (1) deposition of Ti on Si (100), followed by reactive sputtering to obtain TiN on top of this layer and (b) codeposition of Ti and Si on Si (100) and then deposition of TiN by reactive sputtering. Reactive sputtering was carried out in a mixture of N2/Ar with 20% N2. Using X-ray diffraction techniques, the structure of the specimens was analyzed.",

author = "Y. Shor and J. Pelleg",

year = "1996",

month = jan,

day = "1",

language = "English",

volume = "402",

pages = "107--112",

journal = "Materials Research Society Symposium - Proceedings",

issn = "0272-9172",

publisher = "Materials Research Society",

note = "Proceedings of the 1995 MRS Fall Symposium ; Conference date: 27-11-1995 Through 30-11-1995",

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TY - JOUR

T1 - Investigation of TiN/TiSi2 bilayer thin films on Si (100) substrate

AU - Shor, Y.

AU - Pelleg, J.

PY - 1996/1/1

Y1 - 1996/1/1

N2 - The conditions of forming a bi-layer structure of TiN/TiSi2 thin film on Si (100) substrate is studied. For this purpose two techniques of producing this structure were applied: (1) deposition of Ti on Si (100), followed by reactive sputtering to obtain TiN on top of this layer and (b) codeposition of Ti and Si on Si (100) and then deposition of TiN by reactive sputtering. Reactive sputtering was carried out in a mixture of N2/Ar with 20% N2. Using X-ray diffraction techniques, the structure of the specimens was analyzed.

AB - The conditions of forming a bi-layer structure of TiN/TiSi2 thin film on Si (100) substrate is studied. For this purpose two techniques of producing this structure were applied: (1) deposition of Ti on Si (100), followed by reactive sputtering to obtain TiN on top of this layer and (b) codeposition of Ti and Si on Si (100) and then deposition of TiN by reactive sputtering. Reactive sputtering was carried out in a mixture of N2/Ar with 20% N2. Using X-ray diffraction techniques, the structure of the specimens was analyzed.

UR - http://www.scopus.com/inward/record.url?scp=0029734381&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0029734381

SN - 0272-9172

VL - 402

SP - 107

EP - 112

JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Proceedings of the 1995 MRS Fall Symposium

Y2 - 27 November 1995 through 30 November 1995

ER -

Investigation of TiN/TiSi₂ bilayer thin films on Si (100) substrate

Abstract

ASJC Scopus subject areas

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