Low Carbon Contamination of Epitaxial Germanium Films Produced by Pyrolysis of Alkyl Germanium Compounds

Y. Avigal, D. Itzhak, M. Schieber

Research output: Contribution to journalArticlepeer-review

13 Scopus citations

Abstract

Thin films of Ge produced by the pyrolysis of alkyl germanium tetramethyl germanium and tetraethyl germanium compounds have been studied for their rates of deposition, crystallinity, and carbon contamination. The pyrolysis reaction has been found to be of first order, and the activation energies have been found to vary with concentration of the alkyl germanium compound between the limits of 25-30. kcal/mole for both tetramethyl and tetraethyl germanium. The morphology and crystallinity of the films vary with the chemical and crystalline structure of the substrate. Good quality and uniform films are produced on monocrystalline germanium substrates preetched in situ with HC1 gas. The carbon contamination is found to be strongly dependent on the substrate material, and it varies between 25 ppm for germanium and 200-50,000 ppm for tungsten substrates.

Original languageEnglish
Pages (from-to)1226-1229
Number of pages4
JournalJournal of the Electrochemical Society
Volume122
Issue number9
DOIs
StatePublished - 1 Jan 1975
Externally publishedYes

Keywords

  • alkyl germanium compounds
  • epitaxial germanium tilms
  • low carbon contamination
  • pyrolysis

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Renewable Energy, Sustainability and the Environment
  • Surfaces, Coatings and Films
  • Electrochemistry
  • Materials Chemistry

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