Abstract
A microlens array is fabricated using a process based on chalcogenide glass As-Se and As-S photoresists. The method is based on modified proximity contact lithography that enables mass production of microlens array with different shapes. The method proposed is essentially the direct formation of 3D microlens array structure in a chalcogenide photoresist that is simultaneously an effective photoresist and a very good infrared optical material.
| Original language | English |
|---|---|
| Pages (from-to) | 158-162 |
| Number of pages | 5 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 3778 |
| State | Published - 1 Jan 1999 |
| Externally published | Yes |
| Event | Proceedings of the 1999 Gradient Index, Miniature, and Diffractive Optical Systems - Denver, CO, USA Duration: 19 Jul 1999 → 21 Jul 1999 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering