Microlens arrays based on chalcogenide glass resists using the proximity micro-lithography method

S. Noach, M. Manevich, M. Klebanov, V. Lyubin, N. P. Eisenberg

Research output: Contribution to journalConference articlepeer-review

9 Scopus citations

Abstract

A microlens array is fabricated using a process based on chalcogenide glass As-Se and As-S photoresists. The method is based on modified proximity contact lithography that enables mass production of microlens array with different shapes. The method proposed is essentially the direct formation of 3D microlens array structure in a chalcogenide photoresist that is simultaneously an effective photoresist and a very good infrared optical material.

Original languageEnglish
Pages (from-to)158-162
Number of pages5
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume3778
StatePublished - 1 Jan 1999
Externally publishedYes
EventProceedings of the 1999 Gradient Index, Miniature, and Diffractive Optical Systems - Denver, CO, USA
Duration: 19 Jul 199921 Jul 1999

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Microlens arrays based on chalcogenide glass resists using the proximity micro-lithography method'. Together they form a unique fingerprint.

Cite this