Modeling the variance of the durations of maintenance activities in semiconductor fabs

Itai Regev; Yisrael Parmet; Diamanta Benson-Karhi

doi:10.1109/ASMC.2016.7491111

Modeling the variance of the durations of maintenance activities in semiconductor fabs

Itai Regev, Yisrael Parmet, Diamanta Benson-Karhi

Department of Industrial Engineering and Management

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

The reduction of equipment variability of availability can significantly reduce cycle times, improve yields, reduce time-to-market and lower overall operational costs. Despite extensive efforts to reduce variability of availability, however, the execution of preventive maintenance (PM) is still one of the main sources of equipment variability of availability in the industry. In this paper, a model for PM duration variance is proposed. The model is based on the parts of the PM and the standard PM flow, and it provides a framework for modeling and segmenting the PM duration variance in the semiconductor industry while highlighting inefficiencies and improvement opportunities.

Original language	English
Title of host publication	2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016
Publisher	Institute of Electrical and Electronics Engineers
Pages	100-105
Number of pages	6
ISBN (Electronic)	9781509002702
DOIs	https://doi.org/10.1109/ASMC.2016.7491111
State	Published - 13 Jun 2016
Event	27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016 - Saratoga Springs, United States Duration: 16 May 2016 → 19 May 2016

Publication series

Name	2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016

Conference

Conference	27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016
Country/Territory	United States
City	Saratoga Springs
Period	16/05/16 → 19/05/16

Keywords

Availability
Imperfect PM
Optimization
Preventive Maintenance (PM)
Variability of Availability

ASJC Scopus subject areas

Industrial and Manufacturing Engineering
Safety, Risk, Reliability and Quality
Electronic, Optical and Magnetic Materials

Access to Document

10.1109/ASMC.2016.7491111

Cite this

Regev, I., Parmet, Y., & Benson-Karhi, D. (2016). Modeling the variance of the durations of maintenance activities in semiconductor fabs. In 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016 (pp. 100-105). Article 7491111 (2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016). Institute of Electrical and Electronics Engineers. https://doi.org/10.1109/ASMC.2016.7491111

Regev, Itai ; Parmet, Yisrael ; Benson-Karhi, Diamanta. / Modeling the variance of the durations of maintenance activities in semiconductor fabs. 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016. Institute of Electrical and Electronics Engineers, 2016. pp. 100-105 (2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016).

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author = "Itai Regev and Yisrael Parmet and Diamanta Benson-Karhi",

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Regev, I, Parmet, Y & Benson-Karhi, D 2016, Modeling the variance of the durations of maintenance activities in semiconductor fabs. in 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016., 7491111, 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016, Institute of Electrical and Electronics Engineers, pp. 100-105, 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016, Saratoga Springs, United States, 16/05/16. https://doi.org/10.1109/ASMC.2016.7491111

Modeling the variance of the durations of maintenance activities in semiconductor fabs. / Regev, Itai; Parmet, Yisrael; Benson-Karhi, Diamanta.
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016. Institute of Electrical and Electronics Engineers, 2016. p. 100-105 7491111 (2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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Regev I, Parmet Y, Benson-Karhi D. Modeling the variance of the durations of maintenance activities in semiconductor fabs. In 2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016. Institute of Electrical and Electronics Engineers. 2016. p. 100-105. 7491111. (2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference, ASMC 2016). doi: 10.1109/ASMC.2016.7491111

Modeling the variance of the durations of maintenance activities in semiconductor fabs

Abstract

Publication series

Conference

Keywords

ASJC Scopus subject areas

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