Monte Carlo simulation of laser induced chemical vapor deposition

Yehuda Zeiri, Uzi Atzmony, Joseph Bloch, Robert R. Lucchese

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


We have used a Monte Carlo method to simulate laser induced chemical vapor deposition processes, assuming that the laser beam photodissociates the parent organometallic molecules in the gas phase. Metal containing fragments formed during the organometallic decomposition may diffuse to the substrate and are assumed to be instantly adsorbed on the surface at the point they hit. The effects of the total gas pressure in the system, the nature of the buffer gas, and the intensity of the laser beam on the shape of the deposited layers and on the deposition kinetics were studied. This model is also applicable to the simulation of electron beam chemical vapor deposition when low pressures are considered.

Original languageEnglish
Pages (from-to)4110-4115
Number of pages6
JournalJournal of Applied Physics
Issue number7
StatePublished - 1 Dec 1991
Externally publishedYes

ASJC Scopus subject areas

  • General Physics and Astronomy


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