Non-linear dissolution of amorphous arsenic sulfide-selenide photoresist films

V. Lyubin, A. Arsh, M. Klebanov, M. Manevich, J. Varshal, R. Dror, B. Sfez, A. V. Latyshev, D. A. Nasimov, N. P. Eisenberg

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


The properties of non-linear inorganic chalcogenide photoresists fabricated by co-evaporation of Ag with amorphous arsenic sulfide-selenide materials are considered in detail. The influence of several factors, including Ag concentration, irradiation wavelength and composition of the developer on the photoresists characteristics was studied. Superlinear dissolution characteristics of the photoresists are explained in the frame of the so-called "percolation approach". The advantages of superlinear photoresists, especially for the case of maskless photolithography, are briefly discussed.

Original languageEnglish
Pages (from-to)109-114
Number of pages6
JournalApplied Physics A: Materials Science and Processing
Issue number1
StatePublished - 1 Oct 2009

ASJC Scopus subject areas

  • Chemistry (all)
  • Materials Science (all)


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