Abstract
In this chapter, the authors summarize the efforts to use light radiation on graphene and related materials for structural synthesis as well as in unraveling new properties and phenomena. By using various radiation sources such as sunlight, ultraviolet (UV) light, and excimer laser radiation, the authors have discovered interesting photochemical transformations involving reduction of graphene oxide (GO) to graphene and dehydrogenation of hydrogenated graphene. Photochemical transformations of GO to reduced graphene oxide (RGO) and of hydrogenated graphene to graphene has indeed been conveniently exploited for patterning applications. For the purpose of patterning, utilizing local reduction of GO films, the films are spin-coated onto silicon substrates subjected to Ar ion plasma treatment. Various graphitic materials have been tested for possible photothermal effects. The photothermal effects were analyzed on few-layer graphene, prepared by thermal exfoliation of graphite oxide and functionalized by acid treatment, along with hydrogenated graphene prepared by Birch reduction of graphene.
Original language | English |
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Title of host publication | Chemical synthesis and applications of graphene and carbon materials |
Publisher | wiley |
Pages | 159-189 |
Number of pages | 31 |
ISBN (Electronic) | 9783527648160 |
ISBN (Print) | 9783527332083 |
DOIs | |
State | Published - 16 Dec 2016 |
Externally published | Yes |
Keywords
- Carbon materials
- Graphene nanoribbons
- Graphene-based materials
- Laser-induced chemical transformations
- Nanopatterning
- Radiation-induced properties
- Reduced graphene oxide
- UV detector
ASJC Scopus subject areas
- General Chemistry