@inproceedings{2fe0462d488442aeb653eed436576d83,
title = "NZO Reduction via Small Pitch Imaging-Based Overlay Targets",
abstract = "On-product overlay (OPO) control in the DRAM process has become a critical component from node to node to produce high device yield. To meet OPO node goals, Non-Zero Offset (NZO) and its stability across lots must be monitored and controlled. NZO is the bias between overlay (OVL) on-target measurement at After Development Inspection (ADI) vs. on-device measurement at After Etching Inspection (AEI). In this paper, we will present Imaging-Based Overlay (IBO) metrology data at ADI of two different marks, segmented AIM{\textregistered} with design rule patterns and robust AIM (rAIM{\textregistered}) with Moir{\'e} effect with a small pitch. NZO analysis will be presented for each target type including basic performance.",
keywords = "Advanced Imaging Metrology (AIM), After Development Inspection (ADI), After Etching Inspection (AEI), Imaging-Based Overlay (IBO), Non-Zero Offset (NZO), Robust AIM (rAIM), Wavelength tuning (WT)",
author = "Cheng, {Cheng Ta} and Hong Ching and Foster Huang and Zephyr Liu and Dor Yehuda and Michael Har-Zvi and Chris Hsieh and Penny Lin and York Yang",
note = "Publisher Copyright: {\textcopyright} 2024 SPIE.; Metrology, Inspection, and Process Control XXXVIII 2024 ; Conference date: 26-02-2024 Through 29-02-2024",
year = "2024",
month = jan,
day = "1",
doi = "10.1117/12.3010703",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Sendelbach, {Matthew J.} and Schuch, {Nivea G.}",
booktitle = "Metrology, Inspection, and Process Control XXXVIII",
address = "United States",
}