On the "chemical Inertness" of Teflon in Chemical Synthesis

Ran E. Abutbul, Hadar Manis-Levy, Meirav Piness-Sommer, Tzvi Templeman, Nitzan Maman, Iris Visoly-Fisher, Gabby Sarusi, Yuval Golan

Research output: Contribution to journalArticlepeer-review

Abstract

Impurities in Teflon, a material which has become synonymous with chemical inertness, were found to strongly influence the short wave infrared (SWIR) response of solution-deposited PbS:Th thin films. Notable concentrations of Ca-containing compounds were detected in Teflon holders, which are routinely used in many experimental setups, including for solution deposition of semiconductor thin films. It was found that Ca2+ cations leached out from the Teflon sample holders into the aqueous deposition solution and contaminated the PbS:Th thin films. By identifying and subsequently removing the impurity source, the SWIR responsivity of the films was significantly improved.

Original languageEnglish
Pages (from-to)11995-12000
Number of pages6
JournalIndustrial and Engineering Chemistry Research
Volume60
Issue number32
DOIs
StatePublished - 18 Aug 2021

ASJC Scopus subject areas

  • Chemistry (all)
  • Chemical Engineering (all)
  • Industrial and Manufacturing Engineering

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