TY - JOUR
T1 - On the "chemical Inertness" of Teflon in Chemical Synthesis
AU - Abutbul, Ran E.
AU - Manis-Levy, Hadar
AU - Piness-Sommer, Meirav
AU - Templeman, Tzvi
AU - Maman, Nitzan
AU - Visoly-Fisher, Iris
AU - Sarusi, Gabby
AU - Golan, Yuval
N1 - Publisher Copyright:
© 2021 American Chemical Society.
PY - 2021/8/18
Y1 - 2021/8/18
N2 - Impurities in Teflon, a material which has become synonymous with chemical inertness, were found to strongly influence the short wave infrared (SWIR) response of solution-deposited PbS:Th thin films. Notable concentrations of Ca-containing compounds were detected in Teflon holders, which are routinely used in many experimental setups, including for solution deposition of semiconductor thin films. It was found that Ca2+ cations leached out from the Teflon sample holders into the aqueous deposition solution and contaminated the PbS:Th thin films. By identifying and subsequently removing the impurity source, the SWIR responsivity of the films was significantly improved.
AB - Impurities in Teflon, a material which has become synonymous with chemical inertness, were found to strongly influence the short wave infrared (SWIR) response of solution-deposited PbS:Th thin films. Notable concentrations of Ca-containing compounds were detected in Teflon holders, which are routinely used in many experimental setups, including for solution deposition of semiconductor thin films. It was found that Ca2+ cations leached out from the Teflon sample holders into the aqueous deposition solution and contaminated the PbS:Th thin films. By identifying and subsequently removing the impurity source, the SWIR responsivity of the films was significantly improved.
UR - http://www.scopus.com/inward/record.url?scp=85113405785&partnerID=8YFLogxK
U2 - 10.1021/acs.iecr.1c01452
DO - 10.1021/acs.iecr.1c01452
M3 - Article
AN - SCOPUS:85113405785
SN - 0888-5885
VL - 60
SP - 11995
EP - 12000
JO - Industrial and Engineering Chemistry Research
JF - Industrial and Engineering Chemistry Research
IS - 32
ER -