Optical near-field lithography in chalcogenide films

Salman Noach, Michael Manevich, Naftali P. Eisenberg, Dan Davidov, Matvey Klebanov, Victor Lyubin

Research output: Contribution to journalArticlepeer-review

8 Scopus citations


Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

Original languageEnglish
Pages (from-to)1054-1057
Number of pages4
JournalOptical Materials
Issue number8-9
StatePublished - 1 Jan 2006

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Computer Science (all)
  • Atomic and Molecular Physics, and Optics
  • Spectroscopy
  • Physical and Theoretical Chemistry
  • Organic Chemistry
  • Inorganic Chemistry
  • Electrical and Electronic Engineering


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