Optical near-field lithography in chalcogenide films

Salman Noach, Michael Manevich, Naftali P. Eisenberg, Dan Davidov, Matvey Klebanov, Victor Lyubin

Research output: Contribution to journalArticlepeer-review

8 Scopus citations

Abstract

Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

Original languageEnglish
Pages (from-to)1054-1057
Number of pages4
JournalOptical Materials
Volume28
Issue number8-9
DOIs
StatePublished - 1 Jan 2006

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