Optical near-field lithography in chalcogenide films

Salman Noach; Michael Manevich; Naftali P. Eisenberg; Dan Davidov; Matvey Klebanov; Victor Lyubin

doi:10.1016/j.optmat.2005.06.004

Optical near-field lithography in chalcogenide films

Salman Noach
, Michael Manevich
, Naftali P. Eisenberg
, Dan Davidov
, Matvey Klebanov
, Victor Lyubin

Department of Physics

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As₂S₃ chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

Original language	English
Pages (from-to)	1054-1057
Number of pages	4
Journal	Optical Materials
Volume	28
Issue number	8-9
DOIs	https://doi.org/10.1016/j.optmat.2005.06.004
State	Published - 1 Jan 2006

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
General Computer Science
Atomic and Molecular Physics, and Optics
Spectroscopy
Physical and Theoretical Chemistry
Organic Chemistry
Inorganic Chemistry
Electrical and Electronic Engineering

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10.1016/j.optmat.2005.06.004

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title = "Optical near-field lithography in chalcogenide films",

abstract = "Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.",

author = "Salman Noach and Michael Manevich and Eisenberg, \{Naftali P.\} and Dan Davidov and Matvey Klebanov and Victor Lyubin",

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language = "English",

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TY - JOUR

T1 - Optical near-field lithography in chalcogenide films

AU - Noach, Salman

AU - Manevich, Michael

AU - Eisenberg, Naftali P.

AU - Davidov, Dan

AU - Klebanov, Matvey

AU - Lyubin, Victor

PY - 2006/1/1

Y1 - 2006/1/1

N2 - Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

AB - Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As2S3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.

UR - https://www.scopus.com/pages/publications/33747886249

U2 - 10.1016/j.optmat.2005.06.004

DO - 10.1016/j.optmat.2005.06.004

M3 - Article

AN - SCOPUS:33747886249

SN - 0925-3467

VL - 28

SP - 1054

EP - 1057

JO - Optical Materials

JF - Optical Materials

IS - 8-9

ER -

Optical near-field lithography in chalcogenide films

Abstract

ASJC Scopus subject areas

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