Optical scatterometry with analytic approaches applied to periodic nano-arrays including anisotropic layers

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1 Scopus citations


Optical scatterometry is being used as a powerful technique for measurement of sub-wavelength periodic structures. It is based on measuring the scattered signal and solving the inverse scattering problem. For periodic nano-arrays with feature size less than 100nm, it is possible to simplify the electromagnetic simulations using the Rytov near quasi-static approximation valid for feature periods only few times less than the wavelength. This is shown to be adequate for the determination of the structure parameters from the zero order reflected or transmitted waves and their polarization or ellipsometric properties. The validity of this approach is applied to lamellar nano-scale grating photo-resist lines on Si substrate. Formulation for structures containing anisotropic multilayers is presented using the 4x4 matrix approach.

Original languageEnglish
Title of host publicationModeling Aspects in Optical Metrology
StatePublished - 27 Nov 2007
EventModeling Aspects in Optical Metrology - Munich, Germany
Duration: 18 Jun 200719 Jun 2007

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X


ConferenceModeling Aspects in Optical Metrology


  • Nano-arrays
  • Optical metrology
  • Scatterometry
  • Subwavelength structures
  • Thin anisotropic films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering


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