Oxidation kinetics of nitrogen doped TiO2-δ thin films: Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient

Misha Sinder; Jianmin Shi; Klaus Dieter Becker

doi:10.4028/www.scientific.net/DDF.383.147

Oxidation kinetics of nitrogen doped TiO_2-δ thin films: Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient

Misha Sinder
, Jianmin Shi
, Klaus Dieter Becker

Department of Materials Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

Abstract

The model explaining the occurrence of the electron concentration step front during oxidation of nitrogen-doped TiO₂-δ thin films is presented. This model is based on ambipolar chemical diffusion coefficient analysis, for which immobile and uniformly distributed nitrogen component is assumed. The diffusion species and oxygen activity (pressure) profiles are obtained by numerical and approximate analytical simulation of the chemical diffusion. The profiles indicate the presence of two separate singularities: the electron concentration step front, and the electronhole recombination reaction front. The electron concentration step front relates to the singularity of the ambipolar diffusion of three types of charged species with essentially different diffusion coefficients.

Original language	English
Title of host publication	Diffusion in Materials DIMAT-2017 - 10th International Conference on Diffusion in Materials
Editors	Eugen Rabkin, Leonid Klinger, Amy Novick-Cohen, Nachum Frage
Publisher	Trans Tech Publications Ltd
Pages	147-152
Number of pages	6
Volume	383
ISBN (Print)	9783035711301
DOIs	https://doi.org/10.4028/www.scientific.net/DDF.383.147
State	Published - 1 Jan 2018
Event	10th International Conference on Diffusion in Materials, DIMAT 2017 - Haifa, Israel Duration: 7 May 2017 → 12 May 2017

Conference

Conference	10th International Conference on Diffusion in Materials, DIMAT 2017
Country/Territory	Israel
City	Haifa
Period	7/05/17 → 12/05/17

Keywords

Ambipolar chemical diffusion
Oxidation kinetics
Parabolic rate law
Titania

ASJC Scopus subject areas

Radiation
General Materials Science
Condensed Matter Physics

Access to Document

10.4028/www.scientific.net/DDF.383.147

Cite this

Sinder, M., Shi, J., & Becker, K. D. (2018). Oxidation kinetics of nitrogen doped TiO_2-δ thin films: Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient. In E. Rabkin, L. Klinger, A. Novick-Cohen, & N. Frage (Eds.), Diffusion in Materials DIMAT-2017 - 10th International Conference on Diffusion in Materials (Vol. 383, pp. 147-152). Trans Tech Publications Ltd. https://doi.org/10.4028/www.scientific.net/DDF.383.147

Sinder, Misha ; Shi, Jianmin ; Becker, Klaus Dieter. / Oxidation kinetics of nitrogen doped TiO_2-δ thin films : Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient. Diffusion in Materials DIMAT-2017 - 10th International Conference on Diffusion in Materials. editor / Eugen Rabkin ; Leonid Klinger ; Amy Novick-Cohen ; Nachum Frage. Vol. 383 Trans Tech Publications Ltd, 2018. pp. 147-152

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abstract = "The model explaining the occurrence of the electron concentration step front during oxidation of nitrogen-doped TiO2-δ thin films is presented. This model is based on ambipolar chemical diffusion coefficient analysis, for which immobile and uniformly distributed nitrogen component is assumed. The diffusion species and oxygen activity (pressure) profiles are obtained by numerical and approximate analytical simulation of the chemical diffusion. The profiles indicate the presence of two separate singularities: the electron concentration step front, and the electronhole recombination reaction front. The electron concentration step front relates to the singularity of the ambipolar diffusion of three types of charged species with essentially different diffusion coefficients.",

keywords = "Ambipolar chemical diffusion, Oxidation kinetics, Parabolic rate law, Titania",

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Sinder, M, Shi, J & Becker, KD 2018, Oxidation kinetics of nitrogen doped TiO_2-δ thin films: Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient. in E Rabkin, L Klinger, A Novick-Cohen & N Frage (eds), Diffusion in Materials DIMAT-2017 - 10th International Conference on Diffusion in Materials. vol. 383, Trans Tech Publications Ltd, pp. 147-152, 10th International Conference on Diffusion in Materials, DIMAT 2017, Haifa, Israel, 7/05/17. https://doi.org/10.4028/www.scientific.net/DDF.383.147

Oxidation kinetics of nitrogen doped TiO_2-δ thin films: Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient. / Sinder, Misha; Shi, Jianmin; Becker, Klaus Dieter.
Diffusion in Materials DIMAT-2017 - 10th International Conference on Diffusion in Materials. ed. / Eugen Rabkin; Leonid Klinger; Amy Novick-Cohen; Nachum Frage. Vol. 383 Trans Tech Publications Ltd, 2018. p. 147-152.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › peer-review

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AB - The model explaining the occurrence of the electron concentration step front during oxidation of nitrogen-doped TiO2-δ thin films is presented. This model is based on ambipolar chemical diffusion coefficient analysis, for which immobile and uniformly distributed nitrogen component is assumed. The diffusion species and oxygen activity (pressure) profiles are obtained by numerical and approximate analytical simulation of the chemical diffusion. The profiles indicate the presence of two separate singularities: the electron concentration step front, and the electronhole recombination reaction front. The electron concentration step front relates to the singularity of the ambipolar diffusion of three types of charged species with essentially different diffusion coefficients.

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Sinder M, Shi J, Becker KD. Oxidation kinetics of nitrogen doped TiO_2-δ thin films: Analysis on the basis of oxygen activity dependence of the chemical diffusion coefficient. In Rabkin E, Klinger L, Novick-Cohen A, Frage N, editors, Diffusion in Materials DIMAT-2017 - 10th International Conference on Diffusion in Materials. Vol. 383. Trans Tech Publications Ltd. 2018. p. 147-152 doi: 10.4028/www.scientific.net/DDF.383.147